Beijing Xingxingyuan Materials Co.,Ltd supplies sputtering targets including rotary NiCr,NiV,Al ,ZnSn,ZnAl,AZO,Si,Sn,Cr and planar NiCr,NiV ,Cr ,TiAl, Al,Si.
Planar NiCr target?(Ni:80/Cr:20±0.5wt%)? Purity99.8%-99.95%. Density:8.5g/cm3.? Grain size:≤50μm, and uniformity for whole target. Straightness ≤0.5mm. Length:3010mm,3710mm and splice。

  • planar Cr target
    Purity99.9%. Density:7.2g/cm3.
    Grain size:≤200μm, and uniformity for whole target.
    Straightness ≤0.1mm.

  • Planar NiV target  (Ni:93/V:7±0.5wt%) Purity99.9%-99.95%. Density:8.7g/cm3.
    Grain size:≤50μm, and uniformity for whole target.
    Straightness ≤0.1mm. Max. length 4 meters.

  • Planar TiAl target  (Ti:50/Al:50±0.5at%)
    Purity99.99%. Density:4.0g/cm3.
    Grain size:≤50μm,and uniformity for whole target.
    Straightness ≤0.1mm.
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